Process control of CVD deposition of Nanocrystalline diamond films by optical emission spectroscopy
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چکیده
In this work NCD films were deposited in a MW-CVD plasma chamber from an Ar/ H2/CH4 plasma and the signals of the C2 dimer in the plasma were analyzed with optical emission spectroscopy (OES) during deposition. By controlling the process parameters the intensity of the C2 emission line was systematically varied and a correlation of plasma parameters with film properties was found in an empirical way for the given reactor and the chosen conditions.
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تاریخ انتشار 2009